Mass Spectrometric Characterizations of Ions Generated in RF Magnetron Discharges during Sputtering of Silver in Ne, Ar, Kr an.d Xe Gases-Reference-Cited by-同舟云学术

Mass Spectrometric Characterizations of Ions Generated in RF Magnetron Discharges during Sputtering of Silver in Ne, Ar, Kr an.d Xe Gases

Published:2013-06-07 Issue:7 Volume:10 Page:593-602
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Pokorný Petr¹,Novotný Michal¹,Musil Jindřich¹,Fitl Přemysl¹,Bulíř Jiří¹,Lančok Ján¹

Affiliation:

1. Department of Analysis of Functional Materials; Institute of Physics AS CR, v.v.i, Academy of Sciences of the Czech Republic; Na Slovance 1999/2, 182 21 Praha 8 Czech Republic

Funder

Czech Science Foundation

Academy of Sciences of the Czech Republic

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201200145/fullpdf

Reference16 articles.

1. Influence of inert gas species on the growth of silver and molybdenum films via a magnetron discharge

2. RF magnetron sputtering of silver thin film in Ne, Ar and Kr discharges—plasma characterisation and surface morphology

3. Nucleation of ultrathin silver layer by magnetron sputtering in Ar/N2 plasma

4. Substrate effects during mid-frequency pulsed DC biasing

5. Noble gas influence on reactive radio frequency magnetron sputter deposition of TiN films

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