Modulating Low Energy Ion Plasma Fluxes for the Growth of Nanoporous Thin Films-Reference-Cited by-同舟云学术

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Modulating Low Energy Ion Plasma Fluxes for the Growth of Nanoporous Thin Films

Published:2015-02-09 Issue:8 Volume:12 Page:719-724
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Alvarez Rafael¹,Lopez-Santos Carmen¹,Ferrer Francisco J.²,Rico Victor¹,Cotrino José¹³,Gonzalez-Elipe Agustín R.¹,Palmero Alberto¹

Affiliation:

1. Instituto de Ciencia de Materiales de Sevilla (CSIC-US); Avda. Americo Vespucio 49 41092 Seville Spain

2. Centro Nacional de Aceleradores (Universidad de Sevilla-CSIC-Junta de Andalucía); Thomas A. Edison 7 E-41092 Sevilla Spain

3. Departamento de Fisica Atómica; Molecular y Nuclear de la Universidad de Sevilla; Avda. Reina Mercedes s/n. Seville Spain

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201400209/fullpdf

Reference36 articles.

1. Introduction to Surface Engineering and Functionally Engineered Materials

2. Recent progress in thin film processing by magnetron sputtering with plasma diagnostics

3. Low Energy Ion Assisted Film Growth

4. Negative ions: The overlooked species in thin film growth by pulsed laser deposition

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