Dislocation Dynamics in Monocrystalline Si near the Melting Point Studied in Situ by X‐Ray Bragg Diffraction Imaging
Author:
Affiliation:
1. IM2NP‐Institut Matériaux Microélectronique Nanosciences de Provence UMR CNRS 7334, Univ. de Toulon Aix‐Marseille Université Campus de Saint Jérôme 13397 Marseille Cedex 20 France
Publisher
Wiley
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssb.202100594
Reference37 articles.
1. Formation mechanism and properties of twinned structures in (111) seeded directionally solidified solar grade silicon
2. Cellular dislocations patterns in monolike silicon: Influence of stress, time under stress and impurity doping
3. Influence of contamination on the electrical activity of crystal defects in silicon
4. LBIC analysis of the electrical activity of dislocations in CZ silicon
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1. In-situ TEM investigation of dislocation healing and recrystallization in nanoscratched silicon at elevated temperatures up to 800 °C;Journal of Materials Research and Technology;2024-07
2. Attempt to correlate dislocations network and distribution to macroscale plane rotations in <001> cast-mono ingots;Solar Energy Materials and Solar Cells;2023-01
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