UV-Assisted Low Temperature Oxide Dielectric Films for TFT Applications-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

UV-Assisted Low Temperature Oxide Dielectric Films for TFT Applications

Published:2014-08-27 Issue:8 Volume:1 Page:1400206
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Hwang Jaeeun¹,Lee Kyungmin¹,Jeong Yesul²,Lee Yong Uk³,Pearson Christopher²,Petty Michael C.²,Kim Hongdoo¹

Affiliation:

1. Department of Advanced Materials Engineering for Information and Electronics; Kyung Hee University; Yongin 446-701 Korea

2. School of Engineering and Computing Sciences and Centre for Molecular and Nanoscale Electronics; Durham University; South Road Durham DH1 3LE UK

3. Centre for Process Innovation Limited; Thomas Wright Way Sedgefield Durham TS21 3FG UK

Funder

National Research Foundation of Korea

Ministry of Trade, Industry & Energy of Korea

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Reference39 articles.

1. Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances

2. Low-temperature, high-performance solution-processed metal oxide thin-film transistors formed by a ‘sol–gel on chip’ process

3. High Performance, Low Temperature Solution-Processed Barium and Strontium Doped Oxide Thin Film Transistors

Cited by 45 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Optical Properties of Aluminum Oxide Compared with Asymptotic Giant Branch Environments from Amorphous to Crystalline Structures;Microscopy and Microanalysis;2024-07

2. Effects of Hydrogen Plasma Treatment on the Electrical Behavior of Solution-Processed ZnO Thin Films;Materials;2024-06-01

3. P‐10.8: Impact of Surface Treatments on High‐k Zirconium Aluminum Oxide Dielectric without Annealing;SID Symposium Digest of Technical Papers;2024-04

4. Photonic post-processing of a multi-material transparent conductive electrode architecture for optoelectronic device integration;RSC Advances;2024

5. Electronic materials for solution-processed TFTs;Materials Research Express;2023-08-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3