Polymer‐Assisted Deposition of Al‐Doped HfO 2 Thin Film with Excellent Dielectric Properties-Reference-Cited by-同舟云学术

Polymer‐Assisted Deposition of Al‐Doped HfO 2 Thin Film with Excellent Dielectric Properties

Published:2019-06-05 Issue:14 Volume:6 Page:1900588
ISSN:2196-7350
Container-title:Advanced Materials Interfaces
language:en
Short-container-title:Adv. Mater. Interfaces

Author:

Park Gyeongbae¹,Yang Heeseung²,Lee Ju Hyun³,Lee Gilwoon¹,Kwak Junghyeok¹,Jeong Unyong¹^ORCID

Affiliation:

1. Department of Materials Science and EngineeringPohang University of Science and Technology 77, Cheongam‐Ro, Nam‐Gu Pohang‐si Gyeongsangbuk‐do 37673 Republic of Korea

2. Basic Materials & Chemicals R&DLG Chem 55, Yeosusandan 2‐ro Yeosu‐si Jeollanam‐do 59611 Republic of Korea

3. Department of Chemical EngineeringPohang University of Science and Technology 77, Cheongam‐Ro, Nam‐Gu Pohang‐si Gyeongsangbuk‐do 37673 Republic of Korea

Funder

Ministry of Science, ICT and Future Planning

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admi.201900588

Reference37 articles.

1. Polymer assisted deposition of epitaxial oxide thin films

2. The origin of ferroelectricity in Hf1−xZrxO2: A computational investigation and a surface energy model

3. Structure and dielectric properties of amorphous high-κoxides: HfO2, ZrO2, and their alloys