Poly(4-methylstyrene-co-chloromethylstyrene): A negative electron beam resist—synthesis and lithography evaluation-Reference-Cited by-同舟云学术

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Poly(4-methylstyrene-co-chloromethylstyrene): A negative electron beam resist—synthesis and lithography evaluation

Published:1992 Issue:3 Volume:28 Page:209-217
ISSN:0959-8103
Container-title:Polymer International
language:en
Short-container-title:Polym. Int.

Author:

Affrossman Stanley,Bakshaee Massoud,Bramley David,Chow Fong,Dix Christopher,Hendy Paul,Jones Mervyn,Ledwith Anthony,Mills Margaret,Tate Phillip Miller,Pethrick Richard A.

Publisher

Wiley

Subject

Polymers and Plastics,Materials Chemistry,Organic Chemistry

Reference24 articles.

1. Contrast in the electron‐beam lithography of substituted aromatic homopolymers and copolymers

2. Electron-beam lithography of chlorinated polystyrenes with narrow molecular weight distributions

3. Molecular parameters and lithographic performance of poly(chloromethylstyrene)—a high‐performance negative electron resist

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Synthesis of benzyl chlorine‐free poly(4‐acetoxystyrene) via cationic polymerization followed by Friedel‐Crafts alkylation;Polymers for Advanced Technologies;2021-03-26

2. Towards Halomethylated Benzene-Bearing Monomeric and Polymeric Substrates;Designed Monomers and Polymers;2011-01

3. Vinylbenzylchloride (Chloromethylstyrene), Polymers, and Copolymers. Recent Reactions and Applications;Journal of Macromolecular Science, Part C: Polymer Reviews;1999-04-02

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