1. Review Article: Reactions of fluorine atoms with silicon, revisited, again;Donnelly V.M.;J. Vac. Sci. Technol., A,2017
2. Thermal decomposition of a silicon‐fluoride adlayer: evidence for spatially inhomogeneous removal of a single monolayer of the silicon substrate;Engstrom J.R.;Phys. Rev. B,1988
3. Reaction of 1,1,1,5,5,5‐hexafluoro‐2,4‐pentadione (H+fac) with iron and iron oxide thin films;George M.A.;J. Electrochem. Soc.,1996
4. Mechanisms of the HF/H2O vapor phase etching of SiO2;Helms C.R.;J. Vac. Sci. Technol., A,1992