Thermally Annealed Sub‐Monolayers of AlF 3 on Cu(100): An STM and XPS Study-Reference-Cited by-同舟云学术

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Thermally Annealed Sub‐Monolayers of AlF 3 on Cu(100): An STM and XPS Study

Published:2018-11-25 Issue:12 Volume:255 Page:1800389
ISSN:0370-1972
Container-title:physica status solidi (b)
language:en
Short-container-title:Phys. Status Solidi B

Author:

Moreno‐López Juan C.¹,Ruano Gustavo²,Ferrón Julio²³,Ayala Paola¹,Passeggi Mario C. G.²³

Affiliation:

1. University of ViennaFaculty of Physics1090WienAustria

2. Instituto de Física del LitoralIFIS‐Litoral (CONICET‐UNL)Güemes3450S3000GLN Santa FeArgentina

3. Facultad de Ingeniería QuímicaDepartamento de FísicaUniversidad Nacional del LitoralSantiago del Estero2829S3000AOM Santa FeArgentina

Funder

CONICET, UNL, ANPCyT PIP

CAI+D's

PICT's

Publisher

Wiley

Subject

Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssb.201800389

Reference25 articles.

1. Morphology and thermal stability of AlF3 thin films grown on Cu(100)

2. STM study of the initial stages ofAlF3on Cu(100)

3. Initial growth stages of AlF3 on Cu(100): an STM study

4. Transport properties of Cu-AlF3-W and Cu-AlF3-Cu heterojunctions using STS measurements and a DFT-NEGF approach

5. Radiolysis and resolution limits of inorganic halide resists

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