Recent Advances in Voltammetry-Reference-Cited by-同舟云学术

Recent Advances in Voltammetry

Published:2015-05-20 Issue:3 Volume:4 Page:224-260
ISSN:2191-1363
Container-title:ChemistryOpen
language:en
Short-container-title:ChemistryOpen

Author:

Batchelor-McAuley Christopher¹,Kätelhön Enno¹,Barnes Edward O.¹,Compton Richard G.¹,Laborda Eduardo²,Molina Angela²

Affiliation:

1. Department of Chemistry; Physical and Theoretical Chemistry Laboratory; University of Oxford; South Parks Road Oxford OX1 3QZ UK

2. Departamento de Química Física; Facultad de Química; Regional Campus of International Excellence ‘Campus Mare Nostrum'; Universidad de Murcia; 30100 Murcia Spain

Publisher

Wiley

Subject

General Chemistry

Reference366 articles.

1. An algorithm of general application for the digital simulation of electrochemical processes

2. A fast implicit finite difference algorithm for the digital simulation of electrochemical processes

3. Digital simulations with the fast implicit finite difference (FIFD) algorithm

4. Digital simulations with the fast implicit finite-difference (FIFD) algorithm. part 4. Simulation of electrical migration and diffuse double-layer effects

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