Influence of ZnO Cap Layer Morphology on the Electrical Properties and Thermal Stability of Al‐Doped ZnO Films-Reference-Cited by-同舟云学术

Influence of ZnO Cap Layer Morphology on the Electrical Properties and Thermal Stability of Al‐Doped ZnO Films

Published:2020-06-12 Issue:16 Volume:217 Page:2000025
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Zhang Yufeng¹,Fei Ziqi¹,Huang Huang¹,Lü Tieyu¹,Mu Rui²^ORCID

Affiliation:

1. College of Physical Science and TechnologyXiamen University Xiamen 361005 China

2. School of Aerospace EngineeringXiamen University Xiamen 361102 China

Funder

Natural Science Foundation of Fujian Province

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.202000025

Reference45 articles.

1. Metal oxides for optoelectronic applications

2. Role of annealing environment on the performances of large area ITO films produced by rf magnetron sputtering

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4. B-doping and annealing on the properties of B and Ga co-doped ZnO films

5. Transparent aluminium zinc oxide thin films with enhanced thermoelectric properties

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