DC and Pulse IV Characteristics of Strain‐Engineered AlGaInN/GaN HEMTs fabricated on Single‐Crystal AlN Substrate

Author:

Miyoshi Makoto12ORCID,Tanaka Sakura1,Kawaide Tomoyuki1,Inoue Akiyoshi1,Egawa Takashi12

Affiliation:

1. Research Center for Nano Devices and Advanced Materials Nagoya Institute of Technology Nagoya 466-8555 Japan

2. Innovation Center for Multi-Business of Nitride Semiconductors Nagoya Institute of Technology Nagoya 466-8555 Japan

Abstract

A high‐electron‐mobility transistor (HEMT) structure consisting of a strain‐engineered quaternary AlGaInN barrier layer on an unintentionally doped (UID) GaN channel layer is grown on a single‐crystal (SC) AlN substrate by metal–organic chemical vapor deposition and subjected to the device fabrication and characterization. It is showed in DC static measurement results that the fabricated HEMTs exhibit good current–voltage (I–V) characteristics without large negative resistance even at high‐current operations. Pulse I–V measurements results indicate that the fabricated devices show a low‐drain–current collapse as unpassivated GaN HEMTs and that it is further improved by applying an Al2O3 surface passivation. The present results signify promising prospects of AlGaInN/GaN HEMTs on SC‐AlN toward future high‐power radio‐frequency (RF) applications.

Funder

Japan Society for the Promotion of Science

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

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