Novel Epitaxy for Nitride Semiconductors Using Plasma Technology-Reference-Cited by-同舟云学术

Novel Epitaxy for Nitride Semiconductors Using Plasma Technology

Published:2020-11-12 Issue:1 Volume:218 Page:2000462
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Oda Osamu¹^ORCID,Hori Masaru¹

Affiliation:

1. Center for Low-temperature Plasma Science (cLPS) Nagoya University ES-425, Furo-cho Chikusa-ku 464-8603 Japan

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.202000462

Reference130 articles.

1. Nitride Semiconductor Devices

2. LEDs for Lighting Applications

3. The Blue Laser Diode

4. Power GaN Devices

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