Oxygen‐Induced Phase Separation in Sputtered Cu–Sn–I–O Thin Films-Reference-Cited by-同舟云学术

Oxygen‐Induced Phase Separation in Sputtered Cu–Sn–I–O Thin Films

Published:2023-01-05 Issue:5 Volume:220 Page:2200646
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Physica Status Solidi (a)

Author:

Zollner Eva M.¹,Selle Susanne²,Yang Chang¹,Ritter Konrad¹,Eckner Stefanie¹,Welter Edmund³,Grundmann Marius¹,Schnohr Claudia S.¹^ORCID

Affiliation:

1. Felix Bloch Institute for Solid State Physics Universität Leipzig Linnéstraße 5 04103 Leipzig Germany

2. Fraunhofer Institute for Microstructure of Materials and Systems IMWS Walter-Hülse-Straße 1 06120 Halle Germany

3. Deutsches Elektronen-Synchrotron DESY Notkestr. 85 22607 Hamburg Germany

Funder

Deutsche Forschungsgemeinschaft

Deutsches Elektronen-Synchrotron

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.202200646

Reference24 articles.

1. Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances

2. Room-temperature fabrication of transparent flexible thin-film transistors using amorphous oxide semiconductors

3. Conversion of an ultra-wide bandgap amorphous oxide insulator to a semiconductor

4. Material Design of p‐Type Transparent Amorphous Semiconductor, Cu–Sn–I

5. Solution-processed amorphous p-type Cu-Sn-I thin films for transparent Cu-Sn-I/IGZO p–n junctions

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