A dual gate material tunnel field effect transistor model incorporating two‐dimensional Poisson and Schrodinger wave equations

Author:

Mohanty Sadhana Subhadarshini1,Dutta Pradipta1ORCID,Das Jitendra Kumar1

Affiliation:

1. Department of Electronics and Communication Engineering Kalinga Institute of Industrial Technology, Deemed to be University Bhubaneswar India

Publisher

Wiley

Subject

Electrical and Electronic Engineering,Computer Science Applications,Modeling and Simulation

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Analog performance and linearity analysis of a p-type group IV-IV SiGe TFET;Journal of Computational Electronics;2024-03-19

2. P-type Dual Material Gate Si and Si(1-x)Gex TFETs: A Comparative Study for DC and Analog/RF Performance Evaluation;2024 Fourth International Conference on Advances in Electrical, Computing, Communication and Sustainable Technologies (ICAECT);2024-01-11

3. Quantization, gate dielectric and channel length effect in double-gate tunnel field-effect transistor;Results in Physics;2022-03

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