Material‐Independent 3D Patterning Via Two‐Photon Lithography and Discontinuous Wetting-Reference-Cited by-同舟云学术

Material‐Independent 3D Patterning Via Two‐Photon Lithography and Discontinuous Wetting

Published:2022-10-10 Issue:5 Volume:8 Page:2201268
ISSN:2365-709X
Container-title:Advanced Materials Technologies
language:en
Short-container-title:Adv Materials Technologies

Author:

Dong Zheqin¹,Monti Joël²,Cui Haijun¹,Welle Alexander³,Singaraju Surya A.²,Blasco Eva²⁴⁵,Levkin Pavel. A.¹^ORCID

Affiliation:

1. Institute of Biological and Chemical Systems – Functional Molecular Systems (IBCS‐FMS) Karlsruhe Institute of Technology (KIT) Hermann‐von‐Helmholtz‐Platz 1 76344 Eggenstein‐Leopoldshafen Germany

2. Institute of Nanotechnology Karlsruhe Institute of Technology (KIT) Hermann‐von‐Helmholtz‐Platz 1 76344 Eggenstein‐Leopoldshafen Germany

3. Institute of Functional Interfaces (IFG) and Karlsruhe Nano Micro Facility (KNMF) Karlsruhe Institute of Technology (KIT) Hermann‐von‐Helmholtz‐Platz 1 76344 Eggenstein‐Leopoldshafen Germany

4. Institute of Organic Chemistry Heidelberg University 69120 Heidelberg Germany

5. Centre for Advanced Materials Heidelberg University 69120 Heidelberg Germany

Funder

California Department of Fish and Game

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Industrial and Manufacturing Engineering,Mechanics of Materials,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/admt.202201268

Reference37 articles.