150 nm × 200 nm Cross‐Point Hexagonal Boron Nitride‐Based Memristors

Author:

Yuan Bin1,Liang Xianhu1,Zhong Liubiao1,Shi Yuanyuan2,Palumbo Felix3,Chen Shaochuan1,Hui Fei4,Jing Xu1,Villena Marco A.1,Jiang Lin1,Lanza Mario1ORCID

Affiliation:

1. Institute of Functional Nano & Soft Materials Collaborative Innovation Center of Suzhou Nano Science & Technology Soochow University 199 Ren‐Ai Road Suzhou 215123 China

2. Andrew and Erna Viterbi Faculty of Electrical Engineering Technion ‐ Israel Institute of Technology Haifa 32000 Israel

3. National Scientific and Technical Research Council (CONICET) UTN‐CNEA Godoy Cruz 2290 Buenos Aires Argentina

4. Department of Materials Science and Engineering Technion – Israel Institute of Technology Haifa 32000 Israel

Funder

Ministry of Education of the People's Republic of China

National Natural Science Foundation of China

Publisher

Wiley

Subject

Electronic, Optical and Magnetic Materials

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