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XPS study during a soft and progressive sputtering of a monolayer on indium phosphide by argon cluster bombardment

  • Published:2018-03-22 Issue:11 Volume:50 Page:1163-1167
  • ISSN:0142-2421
  • Container-title:Surface and Interface Analysis
  • language:en
  • Short-container-title:Surf Interface Anal

Author:

Aureau Damien1ORCID,Frégnaux Mathieu1,Njel Christian2,Vigneron Jackie1,Bouttemy Muriel1,Gonçalves Anne-Marie1,Etcheberry Arnaud1ORCID

Affiliation:

1. Institut Lavoisier de Versailles; Université de Versailles, CEFS2 Versailles, UMR 8180 CNRS-UVSQ; 45 Avenue des Etats Unis 78035 Versailles France

2. Institut des Sciences Analytiques et de Physico-chimie pour l'Environnement et les Materiaux; UMR 5254 Pau Aquitaine France

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference18 articles.

1. Film thickness measurements of SiO2 by XPS;Mitchell;Surf Interface Anal,1994

2. Ion bombardment induced decomposition of PMMA/MA doped with triallylphosphate studied by XPS;Wäsche;Rad Phys Chem,1989

3. Changes in the chemical state of moncrystalline SrTiO3 by argon ion bombardment;Adachi;Appl Surf Sci,1999

4. Chemical stability of polymers under argon gas cluster ion beam and X-ray irradiation;Bernasik;J Vac Sci Technol B,2016

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