Chemical stability of polymers under argon gas cluster ion beam and x-ray irradiation-Reference-Cited by-同舟云学术

Chemical stability of polymers under argon gas cluster ion beam and x-ray irradiation

Published:2016-05 Issue:3 Volume:34 Page:030604
ISSN:2166-2746
Container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
language:en
Short-container-title:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena

Author:

Bernasik Andrzej,Haberko Jakub,Marzec Mateusz M.,Rysz Jakub,Łużny Wojciech,Budkowski Andrzej

Publisher

American Vacuum Society

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Process Chemistry and Technology,Instrumentation,Electronic, Optical and Magnetic Materials

Link

http://avs.scitation.org/doi/pdf/10.1116/1.4943951

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