Affiliation:
1. Chongqing Institute of Green and Intelligent Technology Chinese Academy of Sciences Chongqing 400714 China
2. College of Resources and Environment University of Chinese Academy of Sciences Beijing 100049 China
3. National University of Singapore (Chongqing) Research Institute Chongqing 401123 China
4. College of Advanced Interdisciplinary Studies & Hunan Provincial Key Laboratory of Novel Nano‐Optoelectronic Information Materials and Devices National University of Defense Technology Changsha 410073 China
5. School of Pharmaceutical Sciences Universiti Sains Malaysia Penang 11800 Malaysia
6. College of Chemistry and Chemical Engineering Chongqing University Chongqing 400044 China
Abstract
AbstractMetastructures are widely used in photonic devices, energy conversion, and biomedical applications. However, to fabricate multiple patterns continuously in single etching protocol with highly tunable photonic properties is challenging. Here, a simple and robust dynamic nanosphere lithography is proposed by inserting a spacer between the nanosphere assembly and the wafer. The nanosphere diameter decrease and uneven penetration of the spacer during etching lead to a dynamic masking process. Coupled anisotropic physical ion sputtering and ricocheting with isotropic chemical radical etching achieve highly tunable structures with various 3D patterns continuously forming through a single etching process. Specifically, the nanosphere diameters define the periodicity, the etched spacer forms the upper parts, and the wafer forms the lower parts. Each part of the structure is highly tunable through changing nanosphere diameter, spacer thickness, and etch conditions. Using this protocol, numerous structures of varying sizes including nanomushrooms, nanocones, nanopencils, and nanoneedles with diverse shapes are realized as proof of concepts. The broadband antireflection ability of the nanostructures and their use in surface‐enhanced Raman spectroscopy are also demonstrated for practical application. This method substantially simplifies the fabrication procedure of various metastructures, paving the way for its application in multiple disciplines especially in photonic devices.
Funder
National Natural Science Foundation of China
Chinese Academy of Sciences
Natural Science Foundation of Chongqing Municipality
Cited by
1 articles.
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