Dopant concentration influence on the optical properties of NiO thin films doped by Al and Nb deposited by DC and RF magnetron sputtering-Reference-Cited by-同舟云学术

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Dopant concentration influence on the optical properties of NiO thin films doped by Al and Nb deposited by DC and RF magnetron sputtering

Published:2022-07-07 Issue:10 Volume:54 Page:1078-1086
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surface & Interface Analysis

Author:

Bayahia Dalal¹²^ORCID,Shirbeeny Waleed¹³^ORCID

Affiliation:

1. Department of Physics King Abdulaziz University Jeddah Saudi Arabia

2. Department of Physics Umm Al‐Qura University Mecca Saudi Arabia

3. Department of Physics Alexandria University Alexandria Egypt

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/sia.7134

Reference40 articles.

1. In situ electrochromic efficiency of a nickel oxide thin film: origin of electrochemical process and electrochromic degradation

2. Infra-red photoresponse of mesoscopic NiO-based solar cells sensitized with PbS quantum dot

3. p-Type NiO Hybrid Visible Photodetector

4. High-performance polymer LED using NiOx as a hole-transport layer

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