In situ electrochromic efficiency of a nickel oxide thin film: origin of electrochemical process and electrochromic degradation-Reference-Cited by-同舟云学术

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In situ electrochromic efficiency of a nickel oxide thin film: origin of electrochemical process and electrochromic degradation

Published:2018 Issue:3 Volume:6 Page:646-653
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Liu Qirong¹²³⁴⁵^ORCID,Chen Qianqian⁵³⁴⁶⁷,Zhang Qianqian¹²³⁴⁵,Xiao Yu¹²³⁴⁵,Zhong Xiaolan¹²³⁴⁵,Dong Guobo¹²³⁴⁵,Delplancke-Ogletree Marie-Paule⁵³⁴⁸⁹,Terryn Herman¹⁰¹¹¹²¹³,Baert Kitty¹⁰¹¹¹²¹³,Reniers François⁵³⁴⁶⁷,Diao Xungang¹²³⁴⁵

Affiliation:

1. School of Physics and Nuclear Energy Engineering

2. Beihang University

3. Beijing 100191

4. China

5. ULB-BUAA Plasma Laboratory for Materials and Environment

6. CHANI

7. Faculté of Sciences

8. 4MAT

9. School of Engineering

10. Department of Electrochemical and Surface Engineering (SURF)

11. Vrije Universiteit Brussel

12. Brussels 1050

13. Belgium

Abstract

Schematically deciphering the electrochemical mechanism of the electrochromic NiO_x thin film based on the Li⁺-ion electrolytes.

Funder

Natural Science Foundation of Beijing Municipality

National Natural Science Foundation of China

China Postdoctoral Science Foundation

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2018/TC/C7TC04696K

Reference49 articles.

1. Electrochromic and Colorimetric Properties of Nickel(II) Oxide Thin Films Prepared by Aerosol-Assisted Chemical Vapor Deposition

2. Hydrothermal-synthesized mesoporous nickel oxide nanowall arrays with enhanced electrochromic application

3. Hierarchical NiO microflake films with high coloration efficiency, cyclic stability and low power consumption for applications in a complementary electrochromic device

4. Co-doped NiO nanoflake array films with enhanced electrochromic properties

5. Electrochromic behavior of NiO thin films deposited by e-beam evaporation at room temperature

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