Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films-Reference-Cited by-同舟云学术

Low-Temperature Wafer-Scale Deposition of Continuous 2D SnS2 Films

Published:2018-04-19 Issue:21 Volume:14 Page:1800547
ISSN:1613-6810
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language:en
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Author:

Mattinen Miika¹^ORCID,King Peter J.¹,Khriachtchev Leonid¹,Meinander Kristoffer²,Gibbon James T.³,Dhanak Vin R.³,Räisänen Jyrki²,Ritala Mikko¹^ORCID,Leskelä Markku¹

Affiliation:

1. Department of Chemistry; University of Helsinki; P.O. Box 55 FI-00014 Finland

2. Division of Materials Physics; Department of Physics; University of Helsinki; P.O. Box 43 FI-00014 Finland

3. Stephenson Institute for Renewable Energy and Department of Physics; University of Liverpool; Liverpool L69 7ZF UK

Funder

ASM Microchemistry

Academy of Finland

Engineering and Physical Sciences Research Council

Publisher

Wiley

Subject

Biomaterials,Biotechnology,General Materials Science,General Chemistry

Reference52 articles.

1. Electric Field Effect in Atomically Thin Carbon Films

2. Single-layer MoS2 transistors

3. Booming Development of Group IV–VI Semiconductors: Fresh Blood of 2D Family

4. Tin Disulfide—An Emerging Layered Metal Dichalcogenide Semiconductor: Materials Properties and Device Characteristics

5. Layer-dependent properties ofSnS2andSnSe2two-dimensional materials

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