Photo-Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics-Reference-Cited by-同舟云学术

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Photo-Roll Lithography (PRL) for Continuous and Scalable Patterning with Application in Flexible Electronics

Published:2013-09-08 Issue:45 Volume:25 Page:6554-6561
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Ok Jong G.¹²,Kwak Moon Kyu¹³,Huard Chad M.¹,Youn Hong Seok¹,Guo L. Jay¹²

Affiliation:

1. Department of Electrical Engineering and Computer Science; University of Michigan; Ann Arbor, Michigan 48109 USA

2. Department of Mechanical Engineering; University of Michigan; Ann Arbor, Michigan 48109 USA

3. School of Mechanical Engineering; Kyungpook National University; Daegu 702-701 South Korea

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201303514/fullpdf

Reference25 articles.

1. Recent progress in high resolution lithography

2. Nanoimprint Lithography: Methods and Material Requirements

3. Patterning surfaces with functional polymers

4. Roll-to-roll UV imprint lithography for flexible electronics

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