Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents-Reference-Cited by-同舟云学术

Direct Patterning of Organic Functional Polymers through Conventional Photolithography and Noninvasive Cross-Link Agents

Published:2016-05-06 Issue:26 Volume:28 Page:5249-5254
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Squillaci Marco A.¹,Qiu Feng²,Aliprandi Alessandro¹,Zhang Fan²,Feng Xinliang²³,Samorì Paolo¹

Affiliation:

1. ISIS & icFRC; University of Strasbourg & CNRS; 8 Allée Gaspard Monge 67000 Strasbourg France

2. School of Chemistry and Chemical Engineering; Shanghai Jiao Tong University; Shanghai 200240 P. R. China

3. Center for Advancing Electronics Dresden (CFAED) and Department of Chemistry and Food Chemistry; Technische Universität Dresden; Mommsenstraße 4 01062 Dresden Germany

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference29 articles.

1. Materials and Applications for Large Area Electronics: Solution-Based Approaches

2. Emerging applications of stimuli-responsive polymer materials

3. Organic Thin Film Transistors for Large Area Electronics

4. Device Physics of Solution-Processed Organic Field-Effect Transistors

5. Novel small molecules for organic field-effect transistors: towards processability and high performance

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