High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates-Reference-Cited by-同舟云学术

High-Pressure Chemical Deposition for Void-Free Filling of Extreme Aspect Ratio Templates

Published:2010-09-08 Issue:41 Volume:22 Page:4605-4611
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Baril Neil F.,Keshavarzi Banafsheh,Sparks Justin R.,Krishnamurthi Mahesh,Temnykh Ivan,Sazio Pier J. A.,Peacock Anna C.,Borhan Ali,Gopalan Venkatraman,Badding John V.

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference23 articles.

1. Low-loss singlemode amorphous silicon waveguides

2. Roughness, inhomogeneity, and integrated optics

3. Subwavelength-diameter silica wires for low-loss optical wave guiding

4. Microstructured Optical Fibers as High-Pressure Microfluidic Reactors

5. Ultimate low loss of hollow-core photonic crystal fibres

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