An In Situ Grazing Incidence X-Ray Scattering Study of Block Copolymer Thin Films During Solvent Vapor Annealing
Author:
Affiliation:
1. Polymer Science and Engineering Department, University of Massachusetts at Amherst; 120 Governors Drive Amherst MA 01003 USA
2. Advanced Light Source, Lawrence Berkeley National Laboratory; 1 Cyclotron Road Berkeley CA 94720 USA
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/adma.201302562/fullpdf
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1. Formation of a Cobalt Magnetic Dot Array via Block Copolymer Lithography
2. Block Copolymer Lithography: Periodic Arrays of ~10 11 Holes in 1 Square Centimeter
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4. High Aspect Ratio Sub-15 nm Silicon Trenches From Block Copolymer Templates
5. Assembly of aligned linear metallic patterns on silicon
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