P-26: Reducing the Tails in a Four-Mask Process of Gen 8.5 LCDs

Author:

Liu Xiao Di1,Zeng Li Mei1,Wang Mao Lin1,Li Wen Ying1,Wang Tian Hong1,Kong Xiang Yong1,Chai Li1,Zeng Mian1,Liao Cong Wei1,Song Li Wang1,Chou Yi Fang1,Liu Xiang1,Lee Chia Yu1

Affiliation:

1. Shenzhen China Star Optoelectronics Technology Co., Ltd; Guangdong China

Publisher

Wiley

Reference5 articles.

1. A Novel Four-Mask-Count Process Architecture for TFT-LCDs;Kim;SID Symposium Digest of Technical Papers,2000

2. Advanced Four-Mask Process Architecture for the a-Si TFT Array Manufacturing Method;Song;SID Symposium Digest of Technical Papers,2002

3. Novel Four-Mask Process in the FFS TFT-LCD with Optimum Multiple-Slit Design Applied by the use of a Gray-Tone Mask;Choi;SID Symposium Digest of Technical Papers,2005

4. Integrated a-Si TFT Gate Driver with Reducing Clock Duty Ratio;Chen;SID Symposium Digest of Technical Papers,2009

5. Study of 5-mask TFT array process with low-cost high-yield high-performance characteristics;Chen;Photonics Taiwan. International Society for Optics and Photonics,2010

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