P-26: Reducing the Tails in a Four-Mask Process of Gen 8.5 LCDs
Author:
Affiliation:
1. Shenzhen China Star Optoelectronics Technology Co., Ltd; Guangdong China
Publisher
Wiley
Reference5 articles.
1. A Novel Four-Mask-Count Process Architecture for TFT-LCDs;Kim;SID Symposium Digest of Technical Papers,2000
2. Advanced Four-Mask Process Architecture for the a-Si TFT Array Manufacturing Method;Song;SID Symposium Digest of Technical Papers,2002
3. Novel Four-Mask Process in the FFS TFT-LCD with Optimum Multiple-Slit Design Applied by the use of a Gray-Tone Mask;Choi;SID Symposium Digest of Technical Papers,2005
4. Integrated a-Si TFT Gate Driver with Reducing Clock Duty Ratio;Chen;SID Symposium Digest of Technical Papers,2009
5. Study of 5-mask TFT array process with low-cost high-yield high-performance characteristics;Chen;Photonics Taiwan. International Society for Optics and Photonics,2010
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1. Study and reduction of waterfall effect caused by dimming backlight in LCD based on amorphous silicon TFT;SID Symposium Digest of Technical Papers;2020-07
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