A polymeric photobase generator containing oxime-urethane groups: Crosslinking reaction and application to negative photoresist
Author:
Publisher
Wiley
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/pola.11032/fullpdf
Reference26 articles.
1. Dufour , P. Radiation Curing in Polymer Science and Technology Foussier , J. P. Rabek , J. F. Elsevier Applied Science New York 1993 1 37 47
2. Properties of 2,3-butanedione and 1-phenyl-1,2-propanedione as new photosensitizers for visible light cured dental resin composites
3. Application of an Anthracene Containing Polymer to a Negative Type Photoresist
4. A water-developable negative photoresist based on the photocrosslinking ofN-phenylamide groups with reduced environmental impact
Cited by 28 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Research progress of color photoresists for TFT-LCD;Dyes and Pigments;2024-06
2. P‐94: Strategies for Adjusting the Flowability of Photoresist from Aspects of Material Composition and Manufacturing Process;SID Symposium Digest of Technical Papers;2024-06
3. Phenothiazine-based oxime ester as a photobase generator for thiol-acrylate reactions;European Polymer Journal;2024-01
4. Adjusting the compactness and hydrophobicity of color filters to decrease gas release during TFT-LCD fabrication;Chinese Optics;2024
5. Oxime–Urethane Structure‐Based Dynamically Crosslinked Polyurethane with Robust Reprocessing Properties;Macromolecular Rapid Communications;2022-01-17
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3