P-75: Advanced Halftone Photolithography Using Four-Mask Process Architecture for G8.6 TFT-LCDs-Reference-Cited by-同舟云学术

P-75: Advanced Halftone Photolithography Using Four-Mask Process Architecture for G8.6 TFT-LCDs

Published:2018-05 Issue:1 Volume:49 Page:1471-1474
ISSN:0097-966X
Container-title:SID Symposium Digest of Technical Papers
language:en
Short-container-title:

Author:

Cho An-Thung¹,Hsu James¹,Zhou Jeff¹,Hong Jinn¹,Yang Feng-yun¹,Luo Yan-mei¹,Tian Yi-qun¹,Lei Dan¹,Liu Zhen¹,Mo Qiong-hua¹,Liu Kai-jun¹,Ge Bang-tong¹,Long Feng-xiang¹,Fu Ting-ting¹,Li Min¹,Chen Wade¹,Lu York¹

Affiliation:

1. Chongqing HKC Optoelectronics technology Co., Ltd.; China

Funder

Municipal Administration of State Land, Resources and Housing, Chongqing Municipal Government

HKC optoelectronics technology, China

Publisher

Wiley

Reference5 articles.

1. A Novel Four-Mask-Count Process Architecture for TFT-LCDs;Kim;SID Symposium Digest of Technical Papers,2000

2. Advanced Four-Mask Process Architecture for the a-Si TFT Array Manufacturing Method;Song;SID Symposium Digest of Technical Papers,2002

3. Novel Four-Mask Process in the FFS TFT-LCD with Optimum Multiple-Slit Design Applied by the use of a Gray-Tone Mask;Choi;SID Symposium Digest of Technical Papers,2005

4. Integrated a-Si TFT Gate Driver with Reducing Clock Duty Ratio;Chen;SID Symposium Digest of Technical Papers,2009

5. Viewingangle evaluation method of color shift for LCDs with gray image;Sato;SID,1994

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