GaAs Oxide Desorption under Extreme Ultraviolet Photon Flux-Reference-Cited by-同舟云学术

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GaAs Oxide Desorption under Extreme Ultraviolet Photon Flux

Published:2005-04 Issue:4 Volume:15 Page:587-592
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Ercolani D.,Lazzarino M.,Mori G.,Ressel B.,Sorba L.,Locatelli A.,Cherifi S.,Ballestrazzi A.,Heun S.

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference22 articles.

1. Status of the liquid-xenon-jet laser-plasma source for EUV lithography

2. EUVL masks: requirements and potential solutions

3. Nanoscale oxidation of GaAs-based semiconductors using atomic force microscope

4. Energy spectra of quantum rings

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3. Applications in Surface Science;Surface Microscopy with Low Energy Electrons;2014

4. Identification and thermal stability of the native oxides on InGaAs using synchrotron radiation based photoemission;Journal of Applied Physics;2010-09

5. Beam-induced effects in soft X-ray photoelectron emission microscopy experiments;Journal of Electron Spectroscopy and Related Phenomena;2009-03

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