Deep-UV Photochemistry and Patterning of (Aminoethylaminomethyl)phenethylsiloxane Self-Assembled Monolayers

Author:

Chen M.-S.,Dulcey C. S.,Chrisey L. A.,Dressick W. J.

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference98 articles.

1. L. G. Wade, Jr., Organic Chemistry, 6th ed., Pearson Prentice-Hall, Upper Saddle River, NJ 2003, pp. 870–934.

2. SAMs are much preferred as grafting and imaging layers over direct modification of the existing substrate surface because they: 1) permit tuning of the surface chemistry while preserving useful bulk properties of the substrate, such as transparency and thermal or electrical conductivity; and 2) do not suffer from poor transparency and depth-of-focus issues associated with deep UV-patterning due to their molecular thickness.

3. Surface modification and functionalization through the self-assembled monolayer and graft polymerization

4. Patterning self-assembled monolayers

5. Precision chemical engineering: integrating nanolithography and nanoassembly

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