Azide-phenolic resin UV resist (MRL) for microlithography-Reference-Cited by-同舟云学术

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Azide-phenolic resin UV resist (MRL) for microlithography

Published:1983-12 Issue:17 Volume:23 Page:935-940
ISSN:0032-3888
Container-title:Polymer Engineering and Science
language:en
Short-container-title:Polym. Eng. Sci.

Author:

Iwayanagi Takao,Hashimoto Michiaki,Nonogaki Saburo,Koibuchi Shigeru,Makino Daisuke

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry

Reference16 articles.

1. Ger. Pat., 5,414,057 (1930).

2. Kodak Co., US Pat., 2,852,379 (1958) and

3. 2,940,853 (1960).

4. Microlithography—Key to Solid‐State Device Fabrication

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