Subject
Materials Chemistry,Polymers and Plastics,General Chemistry,Materials Chemistry,Polymers and Plastics,General Chemistry
Reference17 articles.
1. Mid-UV Photoresists Combining Chemical Amplification And Dissolution Inhibition
2. For examples of other three-component positive resist systems see: Novolac + Aryl t-Butyl Carbonates + Onium Salt.
3. Novolac Based Deep-UV Resists
4. (b) and US Patent 3,779,778 (1973).
5. Highly-sensitive novolak-based positive X-ray resist
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