Positive-tone photoresist consisting of a multifunctional acrylate resin that can be patterned after photo-crosslinking-Reference-Cited by-同舟云学术

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Positive-tone photoresist consisting of a multifunctional acrylate resin that can be patterned after photo-crosslinking

Published:2017-10-26 Issue:8 Volume:135 Page:45871
ISSN:0021-8995
Container-title:Journal of Applied Polymer Science
language:en
Short-container-title:J. Appl. Polym. Sci.

Author:

Sugita Hikaru¹^ORCID,Miyashita Yuka¹,Suzuki Hiroyuki¹,Takasugi Shingo¹,Matsumura Nobuji¹,Yoshizawa Mitsuyo¹

Affiliation:

1. Yokkaichi Research Center, JSR Corporation; 100 Kawajiri-cho, Yokkaichi Mie 510-8552 Japan

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/app.45871/fullpdf

Reference39 articles.

1. Photocrosslinkable polymers with degradable properties

2. Reworkable Rresin using Thiol-ene System

3. Graft Copolymers of Acrylonitrile onto Dextrin for Use in Separation Technologies

4. Photo- and thermal curing of tri-functional methacrylate with degradable property

5. Degradable Network Polymers Based on Di(meth)acrylates

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4. Double‐layer resist method to improve descum result when removing negative photoresist;Micro & Nano Letters;2019-05

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