Double‐layer resist method to improve descum result when removing negative photoresist-Reference-Cited by-同舟云学术

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Double‐layer resist method to improve descum result when removing negative photoresist

Published:2019-05 Issue:6 Volume:14 Page:694-697
ISSN:1750-0443
Container-title:Micro & Nano Letters
language:en
Short-container-title:Micro & Nano Letters

Author:

Yang Zheng¹,Wang Qiusen¹,Qi Liping²,Wang Xing¹,Li Kehong¹,Chen Da¹,Li Chen¹,Zou Helin¹

Affiliation:

1. Key Laboratory for Micro/Nano Technology and Systems of Liaoning ProvinceDalian University of TechnologyDalian116024People's Republic of China

2. School of Biomedical EngineeringDalian University of TechnologyDalian116024People's Republic of China

Funder

National Natural Science Foundation of China

Publisher

Institution of Engineering and Technology (IET)

Subject

Condensed Matter Physics,General Materials Science,Biomedical Engineering,Bioengineering

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1049/mnl.2018.5689

Reference27 articles.

1. TakahashiT.: ‘Adaptability of piezoelectric inkjet head’ 2001 pp.323–327

2. Intensity modulation of ink-jet oscillographs

3. All inkjet-printed piezoelectric electronic devices: energy generators, sensors and actuators

4. Process Improvement of PCB Electric Circuit Pattern by Ink Drop Jetting Control and Characteristics Analysis of Industrial Inkjet Piezoelectric Print Head

5. Double-chained cationic surfactant modification of SU-8/Pyrex® microchips for electrochemical sensing of carboxylic ferrocene after reverse electrophoresis

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