Initiated Chemical Vapor Deposition of Polymer Films at High Process Temperature for the Fabrication of Organic/Inorganic Multilayer Thin Film Encapsulation-Reference-Cited by-同舟云学术

Initiated Chemical Vapor Deposition of Polymer Films at High Process Temperature for the Fabrication of Organic/Inorganic Multilayer Thin Film Encapsulation

Published:2017-03-31 Issue:7 Volume:19 Page:1600870
ISSN:1438-1656
Container-title:Advanced Engineering Materials
language:en
Short-container-title:Adv. Eng. Mater.

Author:

Kim Bong Jun¹,Seong Hyejeong¹,Shim Hyunjeong¹,Lee Young Il¹,Im Sung Gap¹

Affiliation:

1. Department of Chemical & Biomolecular Engineering; Korea Advanced Institute of Science and Technology; 291 Daehak-ro Yuseong-gu Daejeon, 34141 Korea

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Reference25 articles.

1. Mechanisms of vapor permeation through multilayer barrier films: Lag time versus equilibrium permeation

2. A monolithic integration of robust, water-/oil-repellent layer onto multilayer encapsulation films for organic electronic devices

3. Organic/inorganic multilayer thin film encapsulation via initiated chemical vapor deposition and atomic layer deposition for its application to organic solar cells

4. Initiated and Oxidative Chemical Vapor Deposition of Polymeric Thin Films: iCVD and oCVD

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