Low‐Temperature Polysilicon Oxide Thin‐Film Transistors with Coplanar Structure Using Six Photomask Steps Demonstrating High Inverter Gain of 264 V V −1
Author:
Affiliation:
1. Advanced Display Research Center Department of Information Display Kyung Hee University Seoul 130‐701 South Korea
2. Department of Computer Engineering Gachon University Gyeonggi 13120 Korea
Publisher
Wiley
Subject
Condensed Matter Physics,General Materials Science
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/adem.201901497
Reference46 articles.
1. Polysilicon TFT technology for active matrix OLED displays
2. A Novel Five-Photomask Low-Temperature Polycrystalline Silicon CMOS Structure for AMLCD Application
3. 16.2: World-Best Performance LTPS TFTs with Robust Bending Properties on AMOLED Displays
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