A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films-Reference-Cited by-同舟云学术

A Novel Direct Liquid Injection Low Pressure Chemical Vapor Deposition System (DLI-LPCVD) for the Deposition of Thin Films

Published:2017-05-12 Issue:8 Volume:19 Page:1700193
ISSN:1438-1656
Container-title:Advanced Engineering Materials
language:en
Short-container-title:Adv. Eng. Mater.

Author:

Vervaele Mattias¹,De Roo Bert¹,Debehets Jolien²,Sousa Marilyne³,Zhang Luman²,Van Bilzen Bart¹,Seré Stephanie¹,Guillon Herve⁴,Rajala Markku⁵,Seo Jin Won²,Locquet Jean-Pierre¹

Affiliation:

1. KU Leuven; Department of Physics and Astronomy; Solid-State physics 3001 Heverlee Belgium

2. KU Leuven; Department of Materials Engineering; 3001 Heverlee Belgium

3. IBM Research GmbH; 8803 Rueschlikon Switzerland

4. Kemstream; 34000 Montpellier France

5. DCA Instruments; 20360 Turku Finland

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/adem.201700193/fullpdf

Reference42 articles.

1. Introduction to Microfabrication

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