Preparation and characterization of molecular photoresists: Crosslinkable positive and water developable negative tones
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
Reference26 articles.
1. Poly[1-(trimethylsilyl)-1-propyne] and related polymers: synthesis, properties and functions
2. Mass spectrometric studies of sulfonyl esters of diazonaphthalenones: Relationship between fragmentation patterns and photolithographic mechanisms
3. Preparation and characterization of copolymers containing (+)-bornyl methacrylate and their racemate for positive-tone photoresist
4. A polymeric photobase generator containing oxime-urethane groups: Crosslinking reaction and application to negative photoresist
5. Free-radical synthesis of narrow polydispersed 2-hydroxyethyl methacrylate-based tetrapolymers for dilute aqueous base developable negative photoresists
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