Area‐Selective Atomic Layer Deposition of MoS 2 using Simultaneous Deposition and Etching Characteristics of MoCl 5-Reference-Cited by-同舟云学术

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Area‐Selective Atomic Layer Deposition of MoS 2 using Simultaneous Deposition and Etching Characteristics of MoCl 5

Published:2021-01-15 Issue:2 Volume:15 Page:2000533
ISSN:1862-6254
Container-title:physica status solidi (RRL) – Rapid Research Letters
language:en
Short-container-title:Phys. Status Solidi RRL

Author:

Ahn Wonsik¹,Lee Hyangsook¹²,Kim Hoijoon¹,Leem Mirine¹,Lee Heesoo¹,Park Taejin³,Lee Eunha²,Kim Hyoungsub¹^ORCID

Affiliation:

1. School of Advanced Materials Science and Engineering Sungkyunkwan University Suwon 16419 Republic of Korea

2. Samsung Advanced Institute of Technology Samsung Electronics Suwon 16678 Republic of Korea

3. Department of Semiconductor and Display Engineering Sungkyunkwan University Suwon 16419 Republic of Korea

Publisher

Wiley

Subject

Condensed Matter Physics,General Materials Science

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssr.202000533

Reference39 articles.

1. Progress, Challenges, and Opportunities in Two-Dimensional Materials Beyond Graphene

2. Emerging energy applications of two-dimensional layered transition metal dichalcogenides

3. Two-dimensional materials with piezoelectric and ferroelectric functionalities

4. Environmental Analysis with 2D Transition-Metal Dichalcogenide-Based Field-Effect Transistors

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic vs. sub-atomic layer deposition: impact of growth rate on the optical and structural properties of MoS₂ and WS₂;2D Materials;2024-03-19

2. Guiding Principles for the Design of a Chemical Vapor Deposition Process for Highly Crystalline Transition Metal Dichalcogenides;physica status solidi (a);2024-03-09

3. Advance in additive manufacturing of 2D materials at the atomic and close-to-atomic scale;npj 2D Materials and Applications;2024-03-06

4. Atomic Layer Deposition of Transition-Metal Dichalcogenides;Crystal Growth & Design;2024-01-04

5. Other Potential 2-D Materials for CMOS Applications;Springer Tracts in Electrical and Electronics Engineering;2024

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