Structural Transformation upon Nitrogen Doping of Ultrananocrystalline Diamond Films by Microwave Plasma CVD

Author:

Teng Chien-Chung1,Song Shin-Min2,Sung Chien-Min3,Lin Chhiu-Tsu1

Affiliation:

1. Department of Chemistry and Biochemistry, Northern Illinois University, Dekalb, IL 60115, USA

2. Department o f Mechanical Engineering, Northern Illinois University, Dekalb, IL 60115, USA

3. Diamond Technology Center, Kinik Company, No. 64, Chung-San Road, Ying-Ko, Taipei County 239, Taiwan

Abstract

The molecular properties and surface morphology of undoped and N-doped ultra-nanocrystalline diamond (UNCD) films deposited by microwave plasma CVD with addition of nitrogen are investigated with various spectroscopic techniques. The results of spatially resolved Raman scattering, ATR/FT-IR and XPS spectra show more amorphous andsp2/sp3ratio characteristics in N-doped UNCD films. The surface morphology in AFM scans shows larger nanocrystalline diamond clusters in N-doped UNCD films. Incorporation of nitrogen into UNCD films has promoted an increase of amorphoussp2-bonded carbons in the grain boundaries and the size of nanocrystalline diamond grains that are well correlated to the reported enhancement of conductivity and structural changes of UNCD films.

Funder

Kinik Company, Taiwan

Publisher

Hindawi Limited

Subject

General Materials Science

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