Low temperature growth of ultrananocrystalline diamond
Author:
Publisher
AIP Publishing
Subject
General Physics and Astronomy
Link
http://aip.scitation.org/doi/pdf/10.1063/1.1769609
Reference35 articles.
1. Effect of Oxygen Component in Magneto-Active Microwave CH4/He Plasma on Large-Area Diamond Nucleation over Si
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3. Low temperature CVD diamond deposition using halogenated precursors — deposition on low melting materials: Al, Zn and glass
4. Electron-emitter fabricated at low temperature by diamond-nano-seeding technique
5. A. Hatta and A. Hiraki, inLow-pressure Synthetic Diamond, edited by B. Dischler and C. Wild (Springer, New York, 1998), p. 103.
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