Adsorption Properties of NF3 and N2O on Al- and Ga-Doped Graphene Surface: A Density Functional Theory Study

Author:

Yi Qilin1,Wei Gang1ORCID,Cao Zhengqin1,Wu Xiaoyu1,Gao Yuanyuan1

Affiliation:

1. College of Electrical Engineering, Chongqing University of Science and Technology, Chongqing 401331, China

Abstract

SF6/N2 gas mixture decomposition components can reflect the operation status inside GIS, and be used for fault diagnosis and monitoring inside GIS. NF3 and N2O are the characteristic decomposition components of SF6/N2 mixed gas. In order to find a potential gas sensitivity material for the detection of NF3 and N2O. This paper investigated the adsorption properties of NF3 and N2O on Al- and Ga- doped graphene monolayers based on density functional theory. Through the analysis of adsorption distance, charge transfer, adsorption energy, energy band structure, etc., the results indicated that the adsorption effect of Al- and Ga-doped graphene to NF3 and N2O are probably good, and these nanomaterials are potential to apply for the monitoring of GIS internal faults.

Funder

Science and Technology Research Program of Chongqing Municipal Education Commission

Publisher

Hindawi Limited

Subject

Surfaces and Interfaces,General Chemical Engineering,General Chemistry

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