Silicon Nanofabrication by Atomic Force Microscopy-Based Mechanical Processing

Author:

Miyake Shojiro1ORCID,Wang Mei2ORCID,Kim Jongduk3

Affiliation:

1. Department of Innovative System Engineering, Nippon Institute of Technology, Miyashiro-machi, Saitama 345-8501, Japan

2. R&D OSG Corporation, Honnogahara 1-15, Toyokawa 442-8544, Japan

3. Park Systems Japan Inc., 1-17-1 Kanda-Nishikicho, Chiyoda-ku, Tokyo 101-0054, Japan

Abstract

This paper reviews silicon nanofabrication processes using atomic force microscopy (AFM). In particular, it summarizes recent results obtained in our research group regarding AFM-based silicon nanofabrication through mechanochemical local oxidation by diamond tip sliding, as well as mechanical, electrical, and electromechanical processing using an electrically conductive diamond tip. Microscopic three-dimensional manufacturing mainly relies on etching, deposition, and lithography. Therefore, a special emphasis was placed on nanomechanical processes, mechanochemical reaction by potassium hydroxide solution etching, and mechanical and electrical approaches. Several important surface characterization techniques consisting of scanning tunneling microscopy and related techniques, such as scanning probe microscopy and AFM, were also discussed.

Publisher

Hindawi Limited

Subject

General Materials Science

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