Investigation of the Optimal Parameters in Hydrothermal Method for the Synthesis of ZnO Nanorods

Author:

Chen Ying-Chung1,Cheng Huan-Yi1,Yang Cheng-Fu2,Hsieh Yuan-Tai3

Affiliation:

1. Department of Electrical Engineering, National Sun Yat-Sen University, Kaohsiung 80424, Taiwan

2. Department of Chemical and Materials Engineering, National University of Kaohsiung, Kaohsiung 81147, Taiwan

3. Department of Electronic Engineering, Southern Taiwan University, Tainan 71005, Taiwan

Abstract

We investigated a two-step method to deposit the ZnO-based nanostructure films, including nanorods and nanoflowers. In the first step, sputtering method was used to deposit the ZnO films on SiO2/Si substrates as the seed layer. In the second step, Zn(NO3)2–6H2O and C6H12N4were used as precursors and hydrothermal process was used as the method to synthesize the ZnO films. After that, the ZnO films were measured by an X-ray diffraction pattern and a FESEM to analyze their crystallization and morphology. We had found that the ZnO films had three different morphologies synthesized on ZnO/SiO2/Si substrates, including irregular-plate structure films, nanorod films, and beautiful chrysanthemum-like clusters (nanoflower films). We would prove that the face direction of ZnO/SiO2/Si substrates in the hydrothermal bottle and deposition time were two important factors to influence the synthesized results of the ZnO films.

Funder

National Science Council

Publisher

Hindawi Limited

Subject

General Materials Science

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