Shortlisted substrate ion etching in combined steered cathodic arc–ubm deposition system: effects on interface architecture, adhesion, and tool performance-Reference-Cited by-同舟云学术

Shortlisted substrate ion etching in combined steered cathodic arc–ubm deposition system: effects on interface architecture, adhesion, and tool performance

Published:2000-04 Issue:2 Volume:16 Page:176-180
ISSN:0267-0844
Container-title:Surface Engineering
language:en
Short-container-title:Surface Engineering

Author:

Schönjahn C.,Lewis D.B.,Petrov I.,

Publisher

Informa UK Limited

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://www.tandfonline.com/doi/pdf/10.1179/026708400101516973

Reference7 articles.

1. Improved Ti1–xAlxN PVD Coatings for Dry High Speed Cutting Operations

2. Multiply stripped ion generation in the metal vapor vacuum arc

3. A new method for hard coatings: ABS TM (arc bond sputtering)

4. I. J. SMITH: PhD thesis, Sheffield Hallam University, UK, 1998.

5. Microstructure and oxidation-resistance of Ti1 − x − y −zAlxCryYzN layers grown by combined steered-arc/unbalanced-magnetron-sputter deposition

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