Structural and chemical analysis of ternary SiCXNY thin films deposited by improved hot filament chemical vapour deposition-Reference-Cited by-同舟云学术

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Structural and chemical analysis of ternary SiCXNY thin films deposited by improved hot filament chemical vapour deposition

Published:2014-07 Issue:sup4 Volume:18 Page:S4-455-S4-459
ISSN:1432-8917
Container-title:Materials Research Innovations
language:en
Short-container-title:Materials Research Innovations

Author:

Zhao W.¹,Shan X.¹,Zhang Z.¹,Zhai C.¹,Yun J.¹,Qu Y.¹

Affiliation:

1. School of Information Science and Technology, Northwest University, Xi’an 710069, China

Publisher

Informa UK Limited

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.tandfonline.com/doi/pdf/10.1179/1432891714Z.000000000836

Reference38 articles.

1. Chen LC and Chen (eds.) KH: ‘Silicon-based material and devices’; 2001, Amsterdam, Elsevier.

2. Structural and electronic properties of wide band gap silicon carbon nitride materials—a first-principles study

3. Influence of SiBNC coating on anti-oxidation property of carbon fibres

4. Preparation and protective surface coatings for low density C/C composite for harden insulation

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Impact of elevated temperature over different properties of CVD SiCN coating developed in Nitrogen gas atmosphere;Silicon;2022-02-03

2. A review on various techniques implemented for the synthesis of SiliconCarbo-Nitride (SiCN) coatings;PROCEEDINGS OF ADVANCED MATERIAL, ENGINEERING & TECHNOLOGY;2020

3. The growth of 3C-SiC on Si substrate using a SiCN buffer layer;Thin Solid Films;2018-09

4. The formation of SiCN film on Si substrate by constant-source diffusion;Thin Solid Films;2017-11

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