Fast fabrication of silicon based microstructures using 355 nm UV laser
Author:
Publisher
Informa UK Limited
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Link
http://www.tandfonline.com/doi/pdf/10.1179/174328405X46141
Reference13 articles.
1. Laterally driven accelerometer fabricated in single crystalline silicon
2. A novel high aspect ratio technology for MEMS fabrication using standard silicon wafers
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5. High-aspect-ratio microdrilling in polymeric materials with intense KrF laser radiation
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2. High-power 266 nm laser generation with a NaSr3Be3B3O9F4 crystal;Optics Letters;2018-11-12
3. High average power third harmonic generation at 355 nm with K_3B_6O_10Br crystal;Optics Express;2016-05-03
4. 248nm silicon photoablation: Microstructuring basics;AIP Conference Proceedings;2015
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