Comparison of residual monomer loss from cold-cure orthodontic acrylic resins processed by different polymerization techniques
Author:
Publisher
Informa UK Limited
Subject
Orthodontics
Link
http://www.tandfonline.com/doi/pdf/10.1179/1465313313Y.0000000078
Reference34 articles.
1. The effect of an elevated level of residual monomer on the whitening of a denture base and its physical properties
2. Oral lichenoid eruption due to methacrylate allergy
3. Degree of conversion in denture base materials for varied polymerization techniques 1
4. Influence of polymerization method, curing process, and length of time of storage in water on the residual methyl methacrylate content in dental acrylic resins
5. The effect of preparation conditions of acrylic denture base materials on the level of residual monomer, mechanical properties and water absorption
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