Author:
Shin Seungwoo, ,Kim Seok,Kang Dong Pil,Choi Kwang-Min,Han Sang-Cheol,Cho Young Tae
Publisher
The Korean Society of Manufacturing Process Engineers
Reference17 articles.
1. Ting, C. H., and Thomas E. S., "Methods and needs for low k material research," MRS Online Proceedings Library (OPL), Vol. 381, pp. 3-17, 1995.
2. Semiconductor Industry Association, "International technology roadmap for semiconductors," http://www. itrs. net (2009).
3. Singer, P., "Semiconductor international," Tantalum, Copper and Damascene: The Future of Interconnects, 1998.
4. Hedrick, J. L., Miller, R. D., Hawker, C. J., Carter, K. R., Volksen, W., Yoon, D. Y., and Trollsås, M., “Templating nanoporosity in thin film dielectric insulators,” Adv. Mater., Vol. 10, No. 13, pp. 1049-1053, 1998.
5. Nguyen, C. V., Carter, K. R., Hawker, C. J., Hedrick, J. L., Jaffe, R. L., Miller, R. D., Remenar, J. F., Rhee, H. W., Rice, P. M., Toneym M. F., Trollsas, M. and Yoon, D. Y., “Low-dielectric, Nanoporous Organosilicate Films Prepared via Inorganic/Organic Polymer Hybrid Templates,” Chem. Mater, Vol. 11, No. 11, pp. 3080-3085, 1999.